China Breaks Through 5nm Chip Production Without EUV – How SMIC Outsmarted Chip Sanctions

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SMIC 5nm chip: In a groundbreaking achievement that could reshape the global semiconductor landscape, Semiconductor Manufacturing International Corporation (SMIC) in China has managed to produce 5nm chips without relying on the coveted Extreme Ultraviolet (EUV) lithography.

This move defies the expectations set by the global semiconductor industry, which believed that EUV was essential for chips at 5nm and below. With this remarkable feat, SMIC has proven that innovation can thrive even under the pressure of geopolitical sanctions.

SMIC 5nm chip : No EUV? No Problem for SMIC

For years, EUV lithography, developed and exclusively manufactured by ASML of the Netherlands, was considered essential for producing advanced chips at 5nm and smaller nodes. Due to U.S. sanctions and export restrictions on EUV machines to China, it was widely believed that China’s semiconductor industry would be stuck at 7nm or larger.

However, SMIC shattered this notion by employing an older but innovative technique: Deep Ultraviolet (DUV) lithography combined with the intricate process of Self-Aligned Quadruple Patterning (SAQP). This unconventional method allowed SMIC to create a functional 5nm-class chip, despite not having access to the latest EUV technology.

The Brute Force of DUV and SAQP

The success of SMIC’s 5nm chip production can be credited to Self-Aligned Quadruple Patterning (SAQP), a complex multi-step technique that involves stacking multiple layers of lithography and etching.

While DUV tools are generally considered outdated for cutting-edge semiconductor fabrication, SMIC’s engineers found a way to use these older machines to their advantage. By applying SAQP, they overcame the challenges of precision and miniaturization typically associated with DUV lithography.

It’s worth noting that this approach is not perfect. SAQP is slower, more error-prone, and significantly more expensive than the streamlined EUV process. However, it’s proven effective, resulting in chips capable of competing with those fabricated using EUV.

The Geopolitical Implications

SMIC’s success is more than just a technical achievement—it’s also a powerful geopolitical statement. China’s chip manufacturing ambitions have long been hindered by export restrictions and sanctions imposed by the U.S. and its allies. Yet, SMIC’s defiance of these restrictions demonstrates the resilience and ingenuity of the country’s semiconductor industry.

The 5nm chip produced by SMIC is already powering high-profile devices such as the Huawei Mate 60, which features the Kirin 9000S processor. This development is significant because it allows China to bypass the supply chain of American technology companies, which have dominated the global chip market.

SMIC’s 5nm Chip in Action: Kirin 9000S and Beyond

One of the most noteworthy applications of SMIC’s 5nm chip is the Huawei Mate 60 smartphone, which boasts the Kirin 9000S processor. This chip, manufactured using the 5nm process, is capable of offering cutting-edge features, including satellite call support—a feature that was first introduced in the Huawei Mate 60, beating even the latest iPhone 15 to market.

By achieving this milestone, SMIC is not only advancing China’s position in the semiconductor world but also creating the potential for the country’s technology sector to become more self-sufficient in the face of ongoing international tensions.

Challenges and Roadblocks Ahead

Despite SMIC’s impressive achievements, the road ahead is not without challenges. The SAQP process is far more labor-intensive than EUV, and the risk of defects is higher. Additionally, SMIC will likely face continued pressure from international sanctions, which could limit its ability to scale up production using these techniques.

Moreover, while 5nm chips are a significant accomplishment, the next-generation 3nm and 2nm technologies are still dominated by companies like TSMC and Samsung, both of which have access to EUV. SMIC’s ability to compete at these smaller nodes remains uncertain.

SMIC’s success in producing 5nm chips without EUV is a game-changer for the global semiconductor industry. By leveraging innovative methods like Self-Aligned Quadruple Patterning (SAQP) and deep ultraviolet (DUV) lithography, China has proven that it’s possible to make progress even in the face of geopolitical constraints. This bold move not only strengthens China’s position in the chip manufacturing world but also sends a clear message about the power of engineering ingenuity.

The Ongoing Semiconductor Race: As SMIC continues to push the boundaries of chip manufacturing, the industry will be watching closely to see if it can sustain this momentum and eventually close the technological gap with its competitors.

FAQs

How did SMIC produce 5nm chips without EUV?

SMIC used older DUV lithography combined with Self-Aligned Quadruple Patterning (SAQP), a multi-step process that allows for precision at the 5nm node.

What impact does SMIC’s breakthrough have on China’s tech industry?

This achievement boosts China’s self-sufficiency in semiconductor manufacturing and reduces its reliance on foreign technology, especially in light of ongoing geopolitical tensions.

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